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020 ▼a 9780438345317
035 ▼a (MiAaPQ)AAI10929453
035 ▼a (MiAaPQ)cornellgrad:11118
040 ▼a MiAaPQ ▼c MiAaPQ ▼d 247004
0820 ▼a 621.3
1001 ▼a Zhu, Mingda.
24510 ▼a Exploring Polarization Doping in Gan for Power Applications.
260 ▼a [S.l.]: ▼b Cornell University., ▼c 2018.
260 1 ▼a Ann Arbor: ▼b ProQuest Dissertations & Theses, ▼c 2018.
300 ▼a 167 p.
500 ▼a Source: Dissertation Abstracts International, Volume: 80-01(E), Section: B.
500 ▼a Adviser: Huili Grace Xing.
5021 ▼a Thesis (Ph.D.)--Cornell University, 2018.
520 ▼a GaN has made tremendous progress in photonic and radio frequency applications, largely thanks to its wide band gap (3.4 eV), the high electron mobility (up to 2200 cm2 /V · s) and saturation velocity (>10 7 cm/s). With the wide band gap and high
520 ▼a GaN high electron mobility transistors (HEMTs), which are based on the polarization-induced 2DEG, have already been well researched for power applications. The highest reported breakdown voltage of GaN HEMTs is as high as &sim
520 ▼a In contrast to the polarization-induced 2DEG, the polarization-induced 3D bulk doping is rarely studied for power applications. Here we start by studying the electron mobility in polarization-doped AlxGa 1-x N with a low doping concentration of
520 ▼a Both polarization-induced 2DEG and bulk doping are then applied to a GaN metal- oxide-semiconductor HEMT (MOSHEMT) with a polarization-doped p-type back barrier. This device, referred to as PolarMOSH is an integral component for the power transi
590 ▼a School code: 0058.
650 4 ▼a Electrical engineering.
690 ▼a 0544
71020 ▼a Cornell University. ▼b Electrical & Computer Engrng.
7730 ▼t Dissertation Abstracts International ▼g 80-01B(E).
773 ▼t Dissertation Abstract International
790 ▼a 0058
791 ▼a Ph.D.
792 ▼a 2018
793 ▼a English
85640 ▼u http://www.riss.kr/pdu/ddodLink.do?id=T15000945 ▼n KERIS ▼z 이 자료의 원문은 한국교육학술정보원에서 제공합니다.
980 ▼a 201812 ▼f 2019
990 ▼a ***1012033