| LDR | | 01821nam u200385 4500 |
| 001 | | 000000421434 |
| 005 | | 20190215165317 |
| 008 | | 181129s2018 |||||||||||||||||c||eng d |
| 020 | |
▼a 9780438047785 |
| 035 | |
▼a (MiAaPQ)AAI10814510 |
| 035 | |
▼a (MiAaPQ)princeton:12517 |
| 040 | |
▼a MiAaPQ
▼c MiAaPQ
▼d 247004 |
| 082 | 0 |
▼a 620.5 |
| 100 | 1 |
▼a Zhang, Qi. |
| 245 | 10 |
▼a Flexible Polymer Mold and UV-Curable Materials for Nanoimprint and Advanced Nanofabrication. |
| 260 | |
▼a [S.l.]:
▼b Princeton University.,
▼c 2018. |
| 260 | 1 |
▼a Ann Arbor:
▼b ProQuest Dissertations & Theses,
▼c 2018. |
| 300 | |
▼a 179 p. |
| 500 | |
▼a Source: Dissertation Abstracts International, Volume: 79-10(E), Section: B. |
| 500 | |
▼a Adviser: Stephen Chou. |
| 502 | 1 |
▼a Thesis (Ph.D.)--Princeton University, 2018. |
| 520 | |
▼a As an emerging nanofabrication technique, nanoimprint lithography (NIL) has inspired and realized tremendous inventions of high-performance electronic, photonic, biological and nanodevices. However, challenges are still present in order to embra |
| 520 | |
▼a This work contributes several unique solutions: (1) By manipulating post-imprint Cr etching mask transfer (e.g., inversion, transformation and multiplication) with multi-layer material stack, shadowed film deposition and consecutive imprints, la |
| 590 | |
▼a School code: 0181. |
| 650 | 4 |
▼a Nanotechnology. |
| 690 | |
▼a 0652 |
| 710 | 20 |
▼a Princeton University.
▼b Electrical Engineering. |
| 773 | 0 |
▼t Dissertation Abstracts International
▼g 79-10B(E). |
| 773 | |
▼t Dissertation Abstract International |
| 790 | |
▼a 0181 |
| 791 | |
▼a Ph.D. |
| 792 | |
▼a 2018 |
| 793 | |
▼a English |
| 856 | 40 |
▼u http://www.riss.kr/pdu/ddodLink.do?id=T14998123
▼n KERIS
▼z 이 자료의 원문은 한국교육학술정보원에서 제공합니다. |
| 980 | |
▼a 201812
▼f 2019 |
| 990 | |
▼a ***1012033 |