LDR | | 01438nam u200397 4500 |
001 | | 000000454504 |
005 | | 20210323090112 |
008 | | 210127s2020 |||||||||||||||||c||eng d |
020 | |
▼a 9798698594918 |
040 | |
▼a 247004
▼c 247004
▼d 247004 |
082 | 0 |
▼a 621.3 |
100 | 1 |
▼a Walters, Glen Harris. |
245 | 10 |
▼a Scaling and Design of Thin Film Ferroelectric Hafnium Oxide for Memory and Logic Devices. |
260 | |
▼a [S.l.]:
▼b University of Florida.,
▼c 2020. |
260 | 1 |
▼a Ann Arbor:
▼b ProQuest Dissertations & Theses,
▼c 2020. |
300 | |
▼a 171 p. |
500 | |
▼a Source: Dissertations Abstracts International, Volume: 82-06, Section: B. |
500 | |
▼a Advisor: Nishida, Toshikazu. |
502 | 1 |
▼a Thesis (Ph.D.)--University of Florida, 2020. |
506 | |
▼a This item must not be sold to any third party vendors. |
650 | 4 |
▼a Electrical engineering. |
650 | 4 |
▼a Ferroelectrics. |
650 | 4 |
▼a CMOS. |
650 | 4 |
▼a Semiconductors. |
650 | 4 |
▼a Thin films. |
710 | 20 |
▼a University of Florida.
▼b Electrical and Computer Engineering. |
773 | 0 |
▼t Dissertations Abstracts International
▼g 82-06B. |
773 | |
▼t Dissertation Abstract International |
791 | |
▼a Ph.D. |
792 | |
▼a 2020 |
793 | |
▼a English |
856 | 40 |
▼u http://www.riss.kr/pdu/ddodLink.do?id=T15758990
▼n KERIS
▼z 이 자료의 원문은 한국교육학술정보원에서 제공합니다. |
980 | |
▼a 202102
▼f 2021 |
990 | |
▼a ***1012033 |
991 | |
▼a E-BOOK |