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020 ▼a 9798698594918
040 ▼a 247004 ▼c 247004 ▼d 247004
0820 ▼a 621.3
1001 ▼a Walters, Glen Harris.
24510 ▼a Scaling and Design of Thin Film Ferroelectric Hafnium Oxide for Memory and Logic Devices.
260 ▼a [S.l.]: ▼b University of Florida., ▼c 2020.
260 1 ▼a Ann Arbor: ▼b ProQuest Dissertations & Theses, ▼c 2020.
300 ▼a 171 p.
500 ▼a Source: Dissertations Abstracts International, Volume: 82-06, Section: B.
500 ▼a Advisor: Nishida, Toshikazu.
5021 ▼a Thesis (Ph.D.)--University of Florida, 2020.
506 ▼a This item must not be sold to any third party vendors.
650 4 ▼a Electrical engineering.
650 4 ▼a Ferroelectrics.
650 4 ▼a CMOS.
650 4 ▼a Semiconductors.
650 4 ▼a Thin films.
71020 ▼a University of Florida. ▼b Electrical and Computer Engineering.
7730 ▼t Dissertations Abstracts International ▼g 82-06B.
773 ▼t Dissertation Abstract International
791 ▼a Ph.D.
792 ▼a 2020
793 ▼a English
85640 ▼u http://www.riss.kr/pdu/ddodLink.do?id=T15758990 ▼n KERIS ▼z 이 자료의 원문은 한국교육학술정보원에서 제공합니다.
980 ▼a 202102 ▼f 2021
990 ▼a ***1012033
991 ▼a E-BOOK