대구한의대학교 향산도서관

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1.
저널기사
REGULAR ISSUE PAPERS - Highly Concentrated Ozone Gas Supplied at an Atmospheric Pressure Condition as a New Oxidizing Reagent for the Formation of SiO2 Thin Film on Si: / Koike, Kunihiko ;Ichimura, Shingo ;Kurokawa, Akira ; / Institute of Electrical and Electronics Engineers / Journal of Electronic Materials / 2002 /