대구한의대학교 향산도서관

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저널기사
Growth of SiGe film by using a single-wafer rapid thermal processing UHV/CVD system: / Huang.Wentao Chen.Changchun Li.Xiyou Xiong.Xiaoyi Liu.Zhihong Zhang.Wei Xu.Jun Tsien.Pei-hsin / The Korean Institute of Metals and Materials / Metals and Materials international / 2004 /