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Preparation of Active and Stable High-Surface Area Catalysts by Atomic Layer Deposition
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| 자료유형 | 학위논문 |
|---|---|
| 서명/저자사항 | Preparation of Active and Stable High-Surface Area Catalysts by Atomic Layer Deposition. |
| 개인저자 | Onn, Tzia Ming. |
| 단체저자명 | University of Pennsylvania. Chemical and Biomolecular Engineering. |
| 발행사항 | [S.l.]: University of Pennsylvania., 2018. |
| 발행사항 | Ann Arbor: ProQuest Dissertations & Theses, 2018. |
| 형태사항 | 189 p. |
| 기본자료 저록 | Dissertation Abstracts International 79-10B(E). Dissertation Abstract International |
| ISBN | 9780438035959 |
| 학위논문주기 | Thesis (Ph.D.)--University of Pennsylvania, 2018. |
| 일반주기 |
Source: Dissertation Abstracts International, Volume: 79-10(E), Section: B.
Adviser: Raymond J. Gorte. |
| 요약 | Deactivation of catalytic functional oxides through the loss of surface area is a major concern. The conventional approach to maintain high-surface area of these materials is to incorporate the functional components onto a support which is less |
| 요약 | ALD has been used to form uniform oxides in a layer-by-layer manner with excellent compositional control. However, since ALD was developed in the semi-conductor industry to produce relatively thick films on a flat surface, the design criteria ar |
| 요약 | The first area involved fabricating thin films of Fe2O 3, CeO2, CeZrO4, and LaFeO3 on porous Al2O3. These high-surface area films were shown to be uniform and they exhibited excellent thermal stability up to 1273 K when used as supports for Pd i |
| 요약 | The second area involved stabilizing metal particles by thin films of LaFeO3 and ZrO2 prepared by ALD. Pd supported on LaFeO3 is of interests as it is the classical example of a "smart" catalyst capable of redispersing metal particles following |
| 일반주제명 | Chemical engineering. |
| 언어 | 영어 |
| 바로가기 | 
: 이 자료의 원문은 한국교육학술정보원에서 제공합니다. |
