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Multiscale Computational Fluid Dynamics Modeling: Parallelization and Application to Design and Control of Plasma-Enhanced Chemical Vapor Deposition of Thin Film Solar Cells
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| 자료유형 | 학위논문 |
|---|---|
| 서명/저자사항 | Multiscale Computational Fluid Dynamics Modeling: Parallelization and Application to Design and Control of Plasma-Enhanced Chemical Vapor Deposition of Thin Film Solar Cells. |
| 개인저자 | Crose, Marquis Grant. |
| 단체저자명 | University of California, Los Angeles. Chemical Engineering. |
| 발행사항 | [S.l.]: University of California, Los Angeles., 2018. |
| 발행사항 | Ann Arbor: ProQuest Dissertations & Theses, 2018. |
| 형태사항 | 195 p. |
| 기본자료 저록 | Dissertation Abstracts International 79-11B(E). Dissertation Abstract International |
| ISBN | 9780438078048 |
| 학위논문주기 | Thesis (Ph.D.)--University of California, Los Angeles, 2018. |
| 일반주기 |
Source: Dissertation Abstracts International, Volume: 79-11(E), Section: B.
Adviser: Panagiotis D. Christofides. |
| 요약 | Today, plasma-enhanced chemical vapor deposition (PECVD) remains the dominant processing method for the manufacture of silicon thin films due to inexpensive production and low operating temperatures. Nonetheless, thickness non-uniformity continu |
| 요약 | Motivated by these considerations, novel reactor modeling and operational control strategies are developed in this dissertation. Specifically, a macroscopic reactor scale model is presented which captures the creation of a radio frequency (RF) p |
| 일반주제명 | Chemical engineering. Computational chemistry. Computational physics. |
| 언어 | 영어 |
| 바로가기 | 
: 이 자료의 원문은 한국교육학술정보원에서 제공합니다. |
