대구한의대학교 향산도서관

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Post-CMP dry etching for the removal of the nanoscale subsurface damage layer from a single crystal La₃Ga5Sio14 for a high quality wide band SAW filter device: / LeeD.M. Hwang,S. Lee.B.W. Shim,K.B. Pearton,S.J. Cho,H. / International Organization for Ceramic Processing / Journal of Ceramic Processing Research / 2007 /
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