대구한의대학교 향산도서관

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A study on the strain stability of Si/SiGe layer structure in a heterojunction bipolar transistor during thermal processing: / Liu,zhihong Chen,changchun Huang,wentao Dou,weizhi Shan,yilin Zhang,wei Zhu,jun Tsien,pei-hsin / The Korean Institute of Metals and Materials / Metals and Materials international / 2004 /
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