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Flexible Polymer Mold and UV-Curable Materials for Nanoimprint and Advanced Nanofabrication

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서명/저자사항Flexible Polymer Mold and UV-Curable Materials for Nanoimprint and Advanced Nanofabrication.
개인저자Zhang, Qi.
단체저자명Princeton University. Electrical Engineering.
발행사항[S.l.]: Princeton University., 2018.
발행사항Ann Arbor: ProQuest Dissertations & Theses, 2018.
형태사항179 p.
기본자료 저록Dissertation Abstracts International 79-10B(E).
Dissertation Abstract International
ISBN9780438047785
학위논문주기Thesis (Ph.D.)--Princeton University, 2018.
일반주기 Source: Dissertation Abstracts International, Volume: 79-10(E), Section: B.
Adviser: Stephen Chou.
요약As an emerging nanofabrication technique, nanoimprint lithography (NIL) has inspired and realized tremendous inventions of high-performance electronic, photonic, biological and nanodevices. However, challenges are still present in order to embra
요약This work contributes several unique solutions: (1) By manipulating post-imprint Cr etching mask transfer (e.g., inversion, transformation and multiplication) with multi-layer material stack, shadowed film deposition and consecutive imprints, la
일반주제명Nanotechnology.
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