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Surface and Subsurface Reaction Mechanisms in Atomic Layer Deposition of Metals and Metal Oxides
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| 자료유형 | 학위논문 |
|---|---|
| 서명/저자사항 | Surface and Subsurface Reaction Mechanisms in Atomic Layer Deposition of Metals and Metal Oxides. |
| 개인저자 | Schneider, Joel Richard. |
| 단체저자명 | Stanford University. |
| 발행사항 | [S.l.]: Stanford University., 2022. |
| 발행사항 | Ann Arbor: ProQuest Dissertations & Theses, 2022. |
| 형태사항 | 539 p. |
| 기본자료 저록 | Dissertations Abstracts International 84-05B. Dissertation Abstract International |
| ISBN | 9798352979860 |
| 학위논문주기 | Thesis (Ph.D.)--Stanford University, 2022. |
| 일반주기 |
Source: Dissertations Abstracts International, Volume: 84-05, Section: B.
Advisor: Bent, Stacey. |
| 이용제한사항 | This item must not be sold to any third party vendors. |
| 일반주제명 | Language. Teaching. Reactors. By products. Surface chemistry. Carbon. Molybdenum. Pandemics. Microscopy. Metal oxides. Annotations. Gas flow. Geometry. X-rays. Chemistry. Education. Mathematics. |
| 언어 | 영어 |
| 바로가기 | 
: 이 자료의 원문은 한국교육학술정보원에서 제공합니다. |
